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zamberdine Conley [4 articles]

最近 zamberdine さんのライブラリに追加された論文の中から 著者が Conley. であるものをリストアップしています. You can also see everyone's Conley.
  • Rational Design of High-RI Resists for 193nm Immersion Lithography
    Journal of Photopolymer Science, Vol. 20, No. 5., pp. 665-671.
    by Andrew K Whittaker, Idriss Blakey, Lan Chen, Bronwin Dargaville, Heping Liu, Will Conley, Paul A Zimmerman
    posted to 193nm immersion resist by zamberdine on 2007-09-24 14:19:19 as **
  • High-RI resist polymers for 193 nm immersion lithography
    Advances in Resist Technology and Processing XXII, Vol. 5753, No. 1. (2005), pp. 827-835.
    by Andrew K Whittaker, Idriss Blakey, Heping Liu, David JT Hill, Graeme A George, Will Conley, Paul Zimmerman
    edited by John L Sturtevant
    posted to high qspr resists ri by zamberdine on 2007-09-24 14:11:17 as ***** along with 1 person kewms
  • Synthesis of high refractive index sulfur containing polymers for 193 nm immersion lithography: a progress report
    Proceedings of SPIE, Vol. 6153 (2006)
    by Idriss Blakey, Will Conley, Graeme A George, David J Hill, Heping Liu, Firas Rasoul, Andrew K Whittaker
    posted to high immersion index polymer qspr refractive resist ri by zamberdine on 2007-09-24 13:54:28 as *****
  • Novel high-index resists for 193-nm immersion lithography and beyond
    Proceedings of SPIE, Vol. 6519 (2007)
    by Idriss Blakey, Lan Chen, Bronwin Dargaville, Heping Liu, Andrew Whittaker, Will Conley, Emil Piscani, Georgia Rich, Alvina Williams, Paul Zimmerman
    posted to 193 high immersion nm polymer ri by zamberdine on 2007-09-24 13:51:11 as *****
    • 注: このページを引用する時は次のURLでどうぞ: http://www.citeulike.org/user/zamberdine/author/Conley

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