Rapid annealing and the anomalous diffusion of ion implanted boron into silicon

@article{citeulike:2763705, abstract = {View This Record in Scopus}, author = {Michel, A. E. and Rausch, W. and Ronsheim, P. A. and Kastl, R. H. }, citeulike-article-id = {2763705}, journal = {Applied Physics Letters}, keywords = {apl}, number = {7}, pages = {416--418}, posted-at = {2008-05-07 06:28:09}, priority = {2}, publisher = {AIP}, title = {Rapid annealing and the anomalous diffusion of ion implanted boron into silicon}, url = {http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal\&id=APPLAB000050000007000416000001\&idtype=cvips\&gifs=yes}, volume = {50}, year = {1987} }

TY - JOUR ID - citeulike:2763705 L3 - citeulike-article-id:2763705 TI - Rapid annealing and the anomalous diffusion of ion implanted boron into silicon JF - Applied Physics Letters VL - 50 IS - 7 SP - 416 EP - 418 PB - AIP N2 - View This Record in Scopus KW - apl AU - Michel, AE AU - Rausch, W AU - Ronsheim, PA AU - Kastl, RH PY - 1987/// UR - http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=APPLAB000050000007000416000001&idtype=cvips&gifs=yes ER -