Printing methods and materials for large-area electronic devices

by: ML Chabinyc, WS Wong, AC Arias, S Ready, RA Lujan, JH Daniel, B Krusor, RB Apte, A Salleo, RA Street

Proceedings of the IEEE, Vol. 93, No. 8. (2005), pp. 1491-1499.

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Abstract

Two digital printing methods for the fabrication of active matrix thin-film transistor (AM-TFT) backplanes for displays are described. A process using printed resists layers, referred to as digital lithography, was used to fabricate arrays of hydrogenated amorphous silicon TFTs. TFTs were also fabricated using a combination of digital lithography to pattern metals and inkjet printing to pattern and deposit a polymeric semiconducting layer. The relative performance of amorphous silicon and polymer TFTs were evaluated. The utility of digital lithographic processing was demonstrated by the fabrication of prototype reflective displays using electrophoretic media.

@article{citeulike:731634, abstract = {Two digital printing methods for the fabrication of active matrix thin-film transistor (AM-TFT) backplanes for displays are described. A process using printed resists layers, referred to as digital lithography, was used to fabricate arrays of hydrogenated amorphous silicon TFTs. TFTs were also fabricated using a combination of digital lithography to pattern metals and inkjet printing to pattern and deposit a polymeric semiconducting layer. The relative performance of amorphous silicon and polymer TFTs were evaluated. The utility of digital lithographic processing was demonstrated by the fabrication of prototype reflective displays using electrophoretic media.}, author = {Chabinyc, M. L. and Wong, W. S. and Arias, A. C. and Ready, S. and Lujan, R. A. and Daniel, J. H. and Krusor, B. and Apte, R. B. and Salleo, A. and Street, R. A. }, citeulike-article-id = {731634}, journal = {Proceedings of the IEEE}, keywords = {electronics, flexible}, number = {8}, pages = {1491--1499}, posted-at = {2007-04-22 21:01:30}, priority = {2}, title = {Printing methods and materials for large-area electronic devices}, url = {http://ieeexplore.ieee.org/xpls/abs\_all.jsp?arnumber=1468606}, volume = {93}, year = {2005} }

RIS record

TY - JOUR ID - citeulike:731634 L3 - citeulike-article-id:731634 TI - Printing methods and materials for large-area electronic devices JF - Proceedings of the IEEE VL - 93 IS - 8 SP - 1491 EP - 1499 N2 - Two digital printing methods for the fabrication of active matrix thin-film transistor (AM-TFT) backplanes for displays are described. A process using printed resists layers, referred to as digital lithography, was used to fabricate arrays of hydrogenated amorphous silicon TFTs. TFTs were also fabricated using a combination of digital lithography to pattern metals and inkjet printing to pattern and deposit a polymeric semiconducting layer. The relative performance of amorphous silicon and polymer TFTs were evaluated. The utility of digital lithographic processing was demonstrated by the fabrication of prototype reflective displays using electrophoretic media. KW - electronics KW - flexible AU - Chabinyc, ML AU - Wong, WS AU - Arias, AC AU - Ready, S AU - Lujan, RA AU - Daniel, JH AU - Krusor, B AU - Apte, RB AU - Salleo, A AU - Street, RA PY - 2005/// UR - http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=1468606 ER -

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