Multilayer resist methods for nanoimprint lithography on nonflat surfaces

@article{sun98, abstract = {Five multilayer resist methods (three positive tones and two negative tones) have been devised for nanoimprint lithography on nonflat surfaces. Three of the methods have been demonstrated experimentally on a SiO/sub 2/ surface with 100 nm deep sharp steps. The advantages and disadvantages of each method are discussed. Our results should be applicable to nanoimprint lithography with 10 nm feature size on nonflat surfaces}, address = {Chicago, IL, USA}, author = {Sun, Xiaoyun and Zhuang, Lei and Zhang, Wei and Chou, S. }, citeulike-article-id = {163658}, journal = {Journal of Vacuum Science \& Technology B (Microelectronics and Nanometer Structures)}, keywords = {lithography, nanoimprint, nonplanar}, month = {November}, number = {6}, posted-at = {2005-04-18 19:43:26}, priority = {2}, title = {Multilayer resist methods for nanoimprint lithography on nonflat surfaces}, url = {http://dx.doi.org/10.1116/1.590437}, volume = {16}, year = {1998} }

TY - JOUR ID - sun98 L3 - citeulike-article-id:163658 TI - Multilayer resist methods for nanoimprint lithography on nonflat surfaces JF - Journal of Vacuum Science & Technology B (Microelectronics and Nanometer Structures) VL - 16 IS - 6 AD - Chicago, IL, USA N2 - Five multilayer resist methods (three positive tones and two negative tones) have been devised for nanoimprint lithography on nonflat surfaces. Three of the methods have been demonstrated experimentally on a SiO/sub 2/ surface with 100 nm deep sharp steps. The advantages and disadvantages of each method are discussed. Our results should be applicable to nanoimprint lithography with 10 nm feature size on nonflat surfaces KW - lithography KW - nanoimprint KW - nonplanar AU - Sun, Xiaoyun AU - Zhuang, Lei AU - Zhang, Wei AU - Chou, S PY - 1998/11// UR - http://dx.doi.org/10.1116/1.590437 ER -