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eyliu scatterometry [16 articles]

最近 eyliu さんのライブラリに追加された論文の中から タグ scatterometry. You can also see everyone's scatterometry.
  • Immersion scatterometry for improved nano-scale topography measurements
    physica status solidi (a), Vol. 205, No. 4. (April 2008), pp. 784-788.
    by Elson Liu, Fred L Terry
    posted to immersion me scatterometry by eyliu on 2008-06-19 18:28:53 as read
  • Linewidth measurement on IC masks and wafers by grating test patterns
    Appl. Opt., Vol. 19, No. 4. (15 February 1980), 525.
    by HP Kleinknecht, H Meier
    posted to scatterometry by eyliu on 2008-05-26 21:25:19 as **
  • Computing shape parameter sensitivity of the field of one-dimensional surface-relief gratings by using an analytical approach based on RCWA
    J. Opt. Soc. Am. A, Vol. 24, No. 9. (2007), pp. 2692-2700.
    by NP van der Aa, RMM Mattheij
    posted to coupled-wave diffraction gratings scatterometry by eyliu on 2008-03-03 09:29:36 as *** along with 1 person mpisarenco
  • Specifications, methodologies, and results of evaluation of optical critical dimension scatterometer tools at the 90nm CMOS technology node and beyond
    Metrology, Inspection, and Process Control for Microlithography XIX, Vol. 5752, No. 1. (2005), pp. 304-323.
    by Benjamin D Bunday, Amy Peterson, John A Allgair
    edited by Richard M Silver
    posted to scatterometry by eyliu on 2008-03-02 17:09:37 as ** along with 1 person kewms
  • Evaluation of producer's and consumer's risks in scatterometry and scanning electron microscopy metrology for inline critical dimension metrology
    Journal of Microlithography, Microfabrication, and Microsystems, Vol. 5, No. 4. (2006)
    by Masafumi Asano, Takahiro Ikeda, Toru Koike, Hideaki Abe
    posted to scatterometry by eyliu on 2007-05-15 18:20:49 as **
  • Convergence properties of critical dimension measurements by spectroscopic ellipsometry on gratings made of various materials
    Journal of Applied Physics, Vol. 100, No. 5. (2006)
    by Roman Antos, Jaromir Pistora, Jan Mistrik, Tomuo Yamaguchi, Shinji Yamaguchi, Masahiro Horie, Stefan Visnovsky, Yoshichika Otani
    posted to scatterometry by eyliu on 2007-05-15 18:18:28 as **
  • Expanding horizons: new developments in ellipsometry and polarimetry
    Thin Solid Films, Vol. 455-456 (1 May 2004), pp. 3-13.
    by DE Aspnes
    posted to ellipsometry scatterometry by eyliu on 2007-05-15 18:13:54 as **
  • Critical dimension metrology for sub-150-nm lithographic films using real-time scatterometry
    Metrology, Inspection, and Process Control for Microlithography XVII, Vol. 5038, No. 1. (2003), pp. 585-596.
    by Michael J Anderson
    edited by Daniel J Herr
    posted to metrology scatterometry by eyliu on 2007-03-04 03:02:06 as **
  • Accuracy limitations in specular-mode optical topography extraction
    Metrology, Inspection, and Process Control for Microlithography XVII, Vol. 5038, No. 1. (2003), pp. 547-558.
    by Jr
    edited by Daniel J Herr
    posted to metrology scatterometry by eyliu on 2007-03-02 00:25:31 as **
  • Comparison of solutions to the scatterometry inverse problem
    Metrology, Inspection, and Process Control for Microlithography XVIII, Vol. 5375, No. 1. (2004), pp. 564-575.
    by Christopher J Raymond, Michael E Littau, Andrei Chuprin, Simon Ward
    edited by Richard M Silver
    posted to scatterometry by eyliu on 2007-01-28 20:46:49 as ****
  • Mathematical modelling of indirect measurements in scatterometry
    Measurement, Vol. 39, No. 9. (November 2006), pp. 782-794.
    by H Gross, R Model, M Bar, M Wurm, B Bodermann, A Rathsfeld
    posted to scatterometry by eyliu on 2007-01-15 17:03:15 as **
  • Specular spectroscopic scatterometry in DUV lithography
    Metrology, Inspection, and Process Control for Microlithography XIII, Vol. 3677, No. 1. (1999), pp. 159-168.
    by Xinhui Niu, Nickhil H Jakatdar, Junwei Bao, Costas J Spanos, Sanjay K Yedur
    edited by Bhanwar Singh
    posted to metrology scatterometry by eyliu on 2006-11-04 23:45:18 as ** along with 1 person kewms
  • Specular spectroscopic scatterometry
    Semiconductor Manufacturing, IEEE Transactions on, Vol. 14, No. 2. (2001), pp. 97-111.
    by Xinhui Niu, N Jakatdar, Junwei Bao, CJ Spanos
    posted to metrology scatterometry by eyliu on 2006-08-12 03:44:12 as ***
  • Immersion scatterometry for improved feature resolution and high speed acquisition of resist profiles
    Metrology, Inspection, and Process Control for Microlithography XIX, Vol. 5752, No. 1. (2005), pp. 237-247.
    by Fred L Terry, Joseph J Bendik
    edited by Richard M Silver
    posted to metrology scatterometry by eyliu on 2006-08-02 21:07:51 as *****
  • Scatterometry measurement of sub-0.1 mu m linewidth gratings
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 16, No. 1. (1998), pp. 80-87.
    by Stephen A Coulombe, Babar K Minhas, Christopher J Raymond, Sohail, John R Mcneil
    posted to gratings metrology scatterometry by eyliu on 2006-03-07 20:12:37 as ***** along with 1 person jeriksson
  • Erratum to "Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring" [Thin Solid Films 455-456 (2004) 828-836]
    Thin Solid Films, Vol. 468, No. 1-2. (1 December 2004), pp. 339-346.
    by Hsu-Ting Huang, Fred L Terry
    posted to metrology scatterometry by eyliu on 2006-03-05 21:24:36 as *****
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