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eyliu lithography [8 articles]

最近 eyliu さんのライブラリに追加された論文の中から タグ lithography. You can also see everyone's lithography.
  • Resonant Interferometric Lithography beyond the Diffraction Limit
    Physical Review Letters, Vol. 100, No. 7. (2008)
    by M Kiffner, J Evers, MS Zubairy
    posted to quantum-optics lithography interference by eyliu on 2008-07-13 09:25:34 as **
  • Fabrication of 50 nm period gratings with multilevel interference lithography
    Opt. Lett., Vol. 33, No. 14. (15 July 2008), pp. 1572-1574.
    by Chih-Hao Chang, Y Zhao, RK Heilmann, ML Schattenburg
    posted to lithography interference by eyliu on 2008-07-13 01:48:10 as **
  • The k[sub 3] coefficient in nonparaxial lambda/NA scaling equations for resolution, depth of focus, and immersion lithography
    Journal of Microlithography, Microfabrication, and Microsystems, Vol. 1, No. 1. (2002), pp. 7-12.
    by Burn J Lin
    posted to immersion lithography by eyliu on 2007-03-07 15:56:02 as **
  • Pushing the limits of lithography
    Nature, Vol. 406, No. 6799. (2000), pp. 1027-1031.
    by Takashi Ito, Shinji Okazaki
    posted to lithography by eyliu on 2007-03-04 03:11:21 as ** along with 1 person kchou
  • Resolution enhancement of 157-nm lithography by liquid immersion
    Optical Microlithography XV, Vol. 4691, No. 1. (2002), pp. 459-465.
    by Michael Switkes, Mordechai Rothschild
    edited by Anthony Yen
    posted to immersion lithography by eyliu on 2007-02-26 20:37:48 as **
  • Implications of immersion lithography on 193-nm photoresists
    Advances in Resist Technology and Processing XXI, Vol. 5376, No. 1. (2004), pp. 34-43.
    by Christopher J Taylor, Charles R Chambers, Ryan Deschner, Robert J Lesuer, Willard E Conley, Sean D Burns, CG Willson
    edited by John L Sturtevant
    posted to immersion lithography by eyliu on 2007-02-23 16:56:18 as ** along with 2 people kewms Pat4TFM
  • Extending optics to 50 nm and beyond with immersion lithography
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, No. 6. (2003), pp. 2794-2799.
    by M Switkes, RR Kunz, M Rothschild, RF Sinta, M Yeung, SY Baek
    posted to immersion lithography by eyliu on 2007-02-23 16:53:40 as **
  • Liquid immersion lithography: Why, how, and when?
    The 48th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, Vol. 22, No. 6. (2004), pp. 2877-2881.
    by M Rothschild, TM Bloomstein, RR Kunz, V Liberman, M Switkes, ST Palmacci, JHC Sedlacek, D Hardy, A Grenville
    posted to immersion lithography by eyliu on 2007-02-21 18:12:01 as **
    • 注: このページを引用する時は次のURLでどうぞ: http://www.citeulike.org/user/eyliu/tag/lithography

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