Solvent-Induced Ordering in Diblock Copolymer Thin FilmsPolymeric Materials Science and Engineering, Vol. 93 (Fall 2005)
|
Reviews
[Write a review of this article]
There are no reviews of this article
Find related articles from these CiteULike users
Find related articles with these CiteULike tags
AbstractThin films of block copolymers (BC) are the focus of intensive investigations due to their self-assembly into well-ordered periodic structures. 1) In the present work, we investigate the microdomain morphology in symmetric PS-b-PMMA diblock copolymer thin films 'annealed' by different selective solvents vapor. 2, 3) PMMA hexagonally cylindrical microdomains oriented normal to the surface (Fig. 1a) can form by tuning the film thickness (less than L o ), the solvent selectivity (selective for PMMA) and solvent annealing time. Thickness confinement and solvent induced the change of film boundary condition are shown to be responsible for the formation of morphology. The resulted nanostructured films turn out to be sensitive to the surrounding medium, i.e., their morphologies and surface properties can be reversibly switchable upon exposure to solvent vapor selective for PS (Fig. 1b). Furthermore, by mixing the symmetric BC with homopolymers and block copolymer, the cylindrical domain sizes can be continuously tuned.
BibTeX record
RIS record