Sat, 26 Jul 2008 03:06:01 BST CiteULike: dwinston library [34 articles] http://www.citeulike.org/user/dwinston CiteULike.org en-gb Copyright © 2004-2008 citeulike.org http://www.citeulike.org/user/dwinston/article/578135 <i>Nature, Vol. 406, No. 6799. (2000), pp. 1047-1054.</i> Ultimate physical limits to computation Seth Lloyd doi:10.1038/35023282 Nature, Vol. 406, No. 6799. (2000), pp. 1047-1054. 2006-04-06T06:08:28-00:00 2000 Nature 406 6799 1047 1054 outthere http://www.citeulike.org/user/dwinston/article/2977130 <i>Nature, Vol. 414, No. 6865. (13 December 2001), pp. 735-738.</i> Hierarchical self-assembly of metal nanostructures on diblock copolymer scaffolds Ward Lopes Heinrich Jaeger doi:10.1038/414735a Nature, Vol. 414, No. 6865. (13 December 2001), pp. 735-738. 2008-07-09T15:19:14-00:00 2001 Nature 414 6865 735 738 bcp self-assembly http://www.citeulike.org/user/dwinston/article/2970474 <i>IBM Journal of Research and Development, Vol. 51, No. 5. (September 2007), pp. 605-633.</i> Polymer self assembly in semiconductor microelectronics CT Black R Ruiz G Breyta JY Cheng ME Colburn KW Guarini HC Kim Y Zhang IBM Journal of Research and Development, Vol. 51, No. 5. (September 2007), pp. 605-633. 2008-07-07T15:53:50-00:00 2007 IBM Journal of Research and Development 51 5 605 633 bcp self-assembly templated http://www.citeulike.org/user/dwinston/article/2937190 <i>Advanced Materials, Vol. 16, No. 23-24. (2004), pp. 2119-2123.</i><br /><br />No abstract. Solvent-Induced Ordering in Thin Film Diblock Copolymer/Homopolymer Mixtures S H Kim M J Misner T P Russell doi:10.1002/adma.200306577 Advanced Materials, Vol. 16, No. 23-24. (2004), pp. 2119-2123. 2008-06-27T13:33:29-00:00 2004 Advanced Materials 16 23-24 2119 2123 bcp solvent_annealing http://www.citeulike.org/user/dwinston/article/2937189 <i>Advanced Materials, Vol. 16, No. 3. (2004), pp. 226-231.</i><br /><br />No abstract. Highly Oriented and Ordered Arrays from Block Copolymers via Solvent Evaporation S H Kim M J Misner T Xu M Kimura T P Russell doi:10.1002/adma.200304906 Advanced Materials, Vol. 16, No. 3. (2004), pp. 226-231. 2008-06-27T13:33:04-00:00 2004 Advanced Materials 16 3 226 231 bcp solvent_annealing http://www.citeulike.org/user/dwinston/article/2937187 <i>J. Am. Chem. Soc., Vol. 128, No. 23. (14 June 2006), pp. 7622-7629.</i><br /><br />Abstract: The self-assembly of triblock copolymers of poly(ethylene oxide-b-methyl methacrylate-b-styrene) (PEO-b-PMMA-b-PS), where PS is the major component and PMMA and PEO are minor components, provides a robust route to highly ordered, nanoporous arrays with cylindrical pores of 10-15 nm that show promise in block copolymer lithography. These ABC triblock copolymers were synthesized by controlled living radical polymerization, and after solvent annealing, thin films showing defect-free cylindrical microdomains were obtained. The key to the successful generation of highly regular, porous thin films is the use of PMMA as a photodegradable mid-block which leads to nanoporous structures with an unprecedented degree of lateral order. The power of using a triblock copolymer when compared to a traditional diblock copolymer is evidenced by the ability to exploit and combine the advantages of two separate diblock copolymer systems, the high degree of lateral ordering inherent in PS-b-PEO diblocks plus the facile degradability of PS-b-PMMA diblock copolymer systems, while negating the corresponding disadvantages, poor degradability in PS-b-PEO systems and no long-range order for PS-b-PMMA diblocks. Defect-Free Nanoporous Thin Films from ABC Triblock Copolymers J Bang SH Kim E Drockenmuller MJ Misner TP Russell CJ Hawker doi:10.1021/ja0608141 J. Am. Chem. Soc., Vol. 128, No. 23. (14 June 2006), pp. 7622-7629. 2008-06-27T13:31:56-00:00 2006 J. Am. Chem. Soc. 128 23 7622 7629 bcp solvent_annealing http://www.citeulike.org/user/dwinston/article/2909534 <i>Science, Vol. 320, No. 5883. (20 June 2008), pp. 1605-1609.</i><br /><br />High-performance organizations and economies work on the basis not only of material interests but also of Adam Smith's "moral sentiments." Well-designed laws and public policies can harness self-interest for the common good. However, incentives that appeal to self-interest may fail when they undermine the moral values that lead people to act altruistically or in other public-spirited ways. Behavioral experiments reviewed here suggest that economic incentives may be counterproductive when they signal that selfishness is an appropriate response; constitute a learning environment through which over time people come to adopt more self-interested motivations; compromise the individual's sense of self-determination and thereby degrade intrinsic motivations; or convey a message of distrust, disrespect, and unfair intent. Many of these unintended effects of incentives occur because people act not only to acquire economic goods and services but also to constitute themselves as dignified, autonomous, and moral individuals. Good organizational and institutional design can channel the material interests for the achievement of social goals while also enhancing the contribution of the moral sentiments to the same ends. 10.1126/science.1152110 Policies Designed for Self-Interested Citizens May Undermine "The Moral Sentiments": Evidence from Economic Experiments Samuel Bowles doi:10.1126/science.1152110 Science, Vol. 320, No. 5883. (20 June 2008), pp. 1605-1609. 2008-06-20T08:07:59-00:00 2008 Science 320 5883 1605 1609 econ http://www.citeulike.org/user/dwinston/article/1189220 <i>(13 Dec 2006)</i><br /><br />To account for strong aging characteristics of citation networks, we modify Google's PageRank algorithm by initially distributing random surfers exponentially with age, in favor of more recent publications. The output of this algorithm, which we call CiteRank, is interpreted as approximate traffic to individual publications in a simple model of how researchers find new information. We develop an analytical understanding of traffic flow in terms of an RPA-like model and optimize parameters of our algorithm to achieve the best performance. The results are compared for two rather different citation networks: all American Physical Society publications and the set of high-energy physics theory (hep-th) preprints. Despite major differences between these two networks, we find that their optimal parameters for the CiteRank algorithm are remarkably similar. Ranking Scientific Publications Using a Simple Model of Network Traffic Dylan Walker Huafeng Xie Koon-Kiu Yan Sergei Maslov (13 Dec 2006) 2007-03-27T14:13:45-00:00 2006 no-tag http://www.citeulike.org/user/dwinston/article/2924967 <i>Solid State Technology, Vol. 51, No. 5. (May 2008), pp. 18-20.</i> Double development offers simpler double patterning Solid State Technology, Vol. 51, No. 5. (May 2008), pp. 18-20. 2008-06-25T03:54:30-00:00 2008 Solid State Technology 51 5 18 20 no-tag http://www.citeulike.org/user/dwinston/article/2924962 <i>Solid State Technology, Vol. 47, No. 6. (June 2004), pp. 26-31.</i> Nanoengineered electronic materials get real with directed self-assembly Daniel Herr Victor Zhirnov Solid State Technology, Vol. 47, No. 6. (June 2004), pp. 26-31. 2008-06-25T03:49:21-00:00 2004 Solid State Technology 47 6 26 31 self-assembly templated http://www.citeulike.org/user/dwinston/article/2924946 <i>Nano Lett., Vol. 7, No. 9. (12 September 2007), pp. 2789-2794.</i><br /><br />Abstract: We report measurements of rapid ordering and preferential alignment in block copolymer films zone annealed below the order-disorder transition temperature. The orientational correlation lengths measured after approximately 5 h above the glass-transition temperature ( 2 m) were an order of magnitude greater than that obtained under equivalent static annealing. The ability to rapidly process polymers with inaccessible order-disorder transition temperatures suggests zone annealing as a route toward more robust nanomanufacturing methods based on block copolymer self-assembly. Orientational Order in Block Copolymer Films Zone Annealed below the Order-Disorder Transition Temperature BC Berry AW Bosse JF Douglas RL Jones A Karim doi:10.1021/nl071354s Nano Lett., Vol. 7, No. 9. (12 September 2007), pp. 2789-2794. 2008-06-25T03:19:02-00:00 2007 Nano Lett. 7 9 2789 2794 bcp http://www.citeulike.org/user/dwinston/article/2919153 <i>Science, Vol. 302, No. 5652. (12 December 2003), pp. 1904-1905.</i><br /><br />10.1126/science.1091064 CHEMISTRY: Polymers Get Organized David Bucknall Harry Anderson doi:10.1126/science.1091064 Science, Vol. 302, No. 5652. (12 December 2003), pp. 1904-1905. 2008-06-23T15:41:50-00:00 2003 Science 302 5652 1904 1905 bcp short http://www.citeulike.org/user/dwinston/article/2887633 <i>Science, Vol. 309, No. 5738. (19 August 2005), pp. 1200-1205.</i><br /><br />Several recent conceptual advances, which take advantage of the design criteria and practical techniques of molecular-level control in organic chemistry, allow preparation of well-defined polymers and nanostructured materials. Two trends are clear: the realization that synthesis of complex macromolecules poses major challenges and opportunities and the expectation that such materials will exhibit distinctive properties and functions. Polymer synthesis methods now being developed will yield well-defined synthetic macromolecules that are capable of mimicking many of the features of proteins (for example, three-dimensional folded structure) and other natural materials. These macromolecules have far-reaching potential for the study of molecular-level behavior at interfaces, in thin films, and in solution, while also enabling the development of encapsulation, drug-delivery, and nanoscale-patterning technologies. 10.1126/science.1109778 The Convergence of Synthetic Organic and Polymer Chemistries Craig Hawker Karen Wooley doi:10.1126/science.1109778 Science, Vol. 309, No. 5738. (19 August 2005), pp. 1200-1205. 2008-06-12T13:14:25-00:00 2005 Science 309 5738 1200 1205 chem http://www.citeulike.org/user/dwinston/article/2887241 <i>Nat Mater, Vol. 3, No. 11. (November 2004), pp. 823-828.</i> Nanostructure engineering by templated self-assembly of block copolymers Joy Cheng Anne Mayes Caroline Ross doi:10.1038/nmat1211 Nat Mater, Vol. 3, No. 11. (November 2004), pp. 823-828. 2008-06-12T12:43:39-00:00 2004 Nat Mater 3 11 823 828 jclub http://www.citeulike.org/user/dwinston/article/2887200 <i>Nano Lett., Vol. 6, No. 10. (11 October 2006), pp. 2332-2337.</i><br /><br />Abstract: The self-assembly of a spherical-morphology block copolymer into V-shaped grooves has been investigated. Although spherical morphology block copolymers typically form a bcc sphere array in bulk, the V groove promotes the formation of a well-ordered fcc close-packed sphere array with the (111) planes of the array parallel to the groove walls. The sphere size in the block copolymer adjusts depending on the commensurability between the periodicity of the block copolymer and the film thickness within the V groove. The top surface of the close-packed array, parallel to the substrate, shows a square symmetry, unlike the hexagonal symmetry seen in monolayers of spherical domains, which may provide a useful geometry for block copolymer lithography. Three-Dimensional Self-Assembly of Spherical Block Copolymer Domains into V-Shaped Grooves VP Chuang JY Cheng TA Savas CA Ross doi:10.1021/nl061866r Nano Lett., Vol. 6, No. 10. (11 October 2006), pp. 2332-2337. 2008-06-12T12:40:46-00:00 2006 Nano Lett. 6 10 2332 2337 jclub http://www.citeulike.org/user/dwinston/article/2883912 <i>Advanced Materials, Vol. 18, No. 5. (2006), pp. 597-601.</i> Pattern Registration Between Spherical Block-Copolymer Domains and Topographical Templates JY Cheng F Zhang HI Smith GJ Vancso CA Ross doi:10.1002/adma.200501936 Advanced Materials, Vol. 18, No. 5. (2006), pp. 597-601. 2008-06-11T22:13:07-00:00 2006 Advanced Materials 18 5 597 601 jclub http://www.citeulike.org/user/dwinston/article/2883906 <i>Nano Lett., Vol. 7, No. 7. (11 July 2007), pp. 2046-2050.</i><br /><br />Abstract: Templated self-assembly of a cylinder-forming poly(styrene-b-dimethylsiloxane) (PS-PDMS) diblock copolymer has been investigated for nanolithography applications. The large -parameter of the blocks and the use of a PDMS-brush substrate surface treatment are especially advantageous for achieving long-range ordering and minimizing defect densities, and the high Si content in PDMS leaves a robust oxide etch mask after two-step reactive ion etching. By adjusting mesa width and solvent-annealing vapor pressure and time, the cylinders can be intentionally oriented parallel or perpendicular to the trench walls. Pattern transfer into thin silica is also demonstrated. This block copolymer system has excellent characteristics for self-assembled nanolithography applications. Orientation-Controlled Self-Assembled Nanolithography Using a Polystyrene-Polydimethylsiloxane Block Copolymer YS Jung CA Ross doi:10.1021/nl070924l Nano Lett., Vol. 7, No. 7. (11 July 2007), pp. 2046-2050. 2008-06-11T22:07:39-00:00 2007 Nano Lett. 7 7 2046 2050 jclub http://www.citeulike.org/user/dwinston/article/2883882 <i>Nano Lett., Vol. 7, No. 6. (13 June 2007), pp. 1516-1520.</i><br /><br />Abstract: Dense, ordered arrays of <100>-oriented Si nanorods with uniform aspect ratios up to 5:1 and a uniform diameter of 15 nm were fabricated by block copolymer lithography based on the inverse of the traditional cylindrical hole strategy and reactive ion etching. The reported approach combines control over diameter, orientation, and position of the nanorods and compatibility with complementary metal oxide semiconductor (CMOS) technology because no nonvolatile metals generating deep levels in silicon, such as gold or iron, are involved. The Si nanorod arrays exhibit the same degree of order as the block copolymer templates. Ordered Arrays of <100>-Oriented Silicon Nanorods by CMOS-Compatible Block Copolymer Lithography D Zschech DH Kim AP Milenin R Scholz R Hillebrand CJ Hawker TP Russell M Steinhart U Gosele doi:10.1021/nl070275d Nano Lett., Vol. 7, No. 6. (13 June 2007), pp. 1516-1520. 2008-06-11T21:45:18-00:00 2007 Nano Lett. 7 6 1516 1520 jclub http://www.citeulike.org/user/dwinston/article/2096023 <i>Nat Mater, Vol. 6, No. 12. (December 2007), pp. 961-965.</i> Enhanced mobility of confined polymers Kyusoon Shin Sergei Obukhov Jiun-Tai Chen June Huh Yoontae Hwang Soonchun Mok Priyanka Dobriyal Pappannan Thiyagarajan Thomas Russell doi:10.1038/nmat2031 Nat Mater, Vol. 6, No. 12. (December 2007), pp. 961-965. 2007-12-12T00:00:58-00:00 2007 Nat Mater 6 12 961 965 Nature Publishing Group jclub http://www.citeulike.org/user/dwinston/article/2883855 <i>Advanced Materials, Vol. 19, No. 24. (2007), pp. 4552-4557.</i> Facile Routes to Patterned Surface Neutralization Layers for Block Copolymer Lithography J Bang J Bae P Löwenhielm C Spiessberger SA Given-Beck TP Russell CJ Hawker doi:10.1002/adma.200701866 Advanced Materials, Vol. 19, No. 24. (2007), pp. 4552-4557. 2008-06-11T21:29:23-00:00 2007 Advanced Materials 19 24 4552 4557 jclub http://www.citeulike.org/user/dwinston/article/2883314 <i>Advanced Materials, Vol. 20 (2008), pp. 681-685.</i> Fabrication of Highly Ordered Silicon Oxide Dots and Stripes from Block Copolymer Thin Films S Park B Kim JY Wang TP Russell doi:10.1002/adma.200701997 Advanced Materials, Vol. 20 (2008), pp. 681-685. 2008-06-11T15:50:16-00:00 2008 Advanced Materials 20 681 685 jclub http://www.citeulike.org/user/dwinston/article/2883263 <i>Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 24, No. 1. (2006), pp. 340-344.</i><br /><br />The directed assembly of binary blends of diblock copolymers on chemically nanopatterned substrates was investigated as a means to pattern features of controlled dimensions at the nanoscale. The lamella-forming blends assembled without defects and in registration with underlying chemical surface patterns that had periods LS that were commensurate with the bulk lamellar period of the blends LB. LB was tuned between the bulk lamellar periods of the block copolymers LO1 and LO2. ©2006 American Vacuum Society Binary blends of diblock copolymers as an effective route to multiple length scales in perfect directed self-assembly of diblock copolymer thin films Erik Edwards Mark Stoykovich Paul Nealey Harun Solak doi:10.1116/1.2151226 Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 24, No. 1. (2006), pp. 340-344. 2008-06-11T15:25:22-00:00 2006 Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 24 1 340 344 AVS jclub http://www.citeulike.org/user/dwinston/article/2883098 <i>Science, Vol. 308, No. 5727. (3 June 2005), pp. 1442-1446.</i><br /><br />Self-assembly is an effective strategy for the creation of periodic structures at the nanoscale. However, because microelectronic devices use free-form design principles, the insertion point of self-assembling materials into existing nanomanufacturing processes is unclear. We directed ternary blends of diblock copolymers and homopolymers that naturally form periodic arrays to assemble into nonregular device-oriented structures on chemically nanopatterned substrates. Redistribution of homopolymer facilitates the defect-free assembly in locations where the domain dimensions deviate substantially from those formed in the bulk. The ability to pattern nonregular structures using self-assembling materials creates new opportunities for nanoscale manufacturing. 10.1126/science.1111041 Directed Assembly of Block Copolymer Blends into Nonregular Device-Oriented Structures Mark Stoykovich Marcus Muller Sang Kim Harun Solak Erik Edwards Juan de Pablo Paul Nealey doi:10.1126/science.1111041 Science, Vol. 308, No. 5727. (3 June 2005), pp. 1442-1446. 2008-06-11T15:22:58-00:00 2005 Science 308 5727 1442 1446 jclub http://www.citeulike.org/user/dwinston/article/2883091 <i>Nature, Vol. 424, No. 6947. (24 July 2003), pp. 411-414.</i> Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates Ouk Harun Solak Mark Stoykovich Nicola Ferrier Juan de Pablo Paul Nealey doi:10.1038/nature01775 Nature, Vol. 424, No. 6947. (24 July 2003), pp. 411-414. 2008-06-11T15:20:45-00:00 2003 Nature 424 6947 411 414 jclub http://www.citeulike.org/user/dwinston/article/2883079 <i>Papers from the 44th international conference on electron, ion, and photon beam technology and nanofabrication, Vol. 18, No. 6. (2000), pp. 3530-3534.</i><br /><br />A technique to create templates for nanofabrication using thin films of diblock copolymers is discussed and demonstrated. Advanced lithographic techniques are used to create chemically patterned surfaces that manipulate the wetting behavior of diblock copolymer films and to guide the spatial microphase separation of the block copolymer domains. Guided microphase separation has great potential for application of block copolymer films in nanofabrication because of perpendicular orientation of the domains to the substrate and macroscopic perfection in the ordering of copolymer domains. Lithography allows for registration of the domains with the substrate for creating addressable arrays. Experimental implementation of the technique is demonstrated using extreme ultraviolet interferometric lithography, self-assembled monolayers of octadecyltrichlorosilane as imaging layers, and the self-assembly of films of symmetric poly(styrene-b-methyl methacrylate). ©2000 American Vacuum Society. Combining advanced lithographic techniques and self-assembly of thin films of diblock copolymers to produce templates for nanofabrication Richard Peters Xiao Yang Qiang Wang Juan de Pablo Paul Nealey doi:10.1116/1.1313572 Papers from the 44th international conference on electron, ion, and photon beam technology and nanofabrication, Vol. 18, No. 6. (2000), pp. 3530-3534. 2008-06-11T15:15:55-00:00 2000 Papers from the 44th international conference on electron, ion, and photon beam technology and nanofabrication 18 6 3530 3534 AVS jclub http://www.citeulike.org/user/dwinston/article/2882904 <i>The 48th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, Vol. 22, No. 6. (2004), pp. 3409-3414.</i><br /><br />The combination of lithography and self-assembly provides a powerful means of organizing solution-synthesized nanostructures for a wide variety of applications. We have developed a fluidic assembly method that relies on the local pinning of a moving liquid contact line by lithographically produced topographic features to concentrate nanoparticles at those features. The final stages of the assembly process are controlled first by long-range immersion capillary forces and then by the short-range electrostatic and van der Waals interactions. We have successfully assembled nanoparticles from 50  to  2  nm in size using this technique and have also demonstrated the controlled positioning of more complex nanotetrapod structures. We have used this process to assemble Au nanoparticles into prepatterned electrode structures and have performed preliminary electrical characterization of the devices so formed. The fluidic assembly method is capable of very high yield, in terms of positioning nanostructures at each lithographically defined location, and of excellent specificity, with essentially no particle deposition between features. ©2004 American Vacuum Society Lithographically directed self-assembly of nanostructures Alexander Liddle Yi Cui Paul Alivisatos doi:10.1116/1.1821572 The 48th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, Vol. 22, No. 6. (2004), pp. 3409-3414. 2008-06-11T15:11:52-00:00 2004 The 48th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication 22 6 3409 3414 AVS jclub http://www.citeulike.org/user/dwinston/article/2776716 <i>Journal of Applied Physics, Vol. 27, No. 8. (1956), pp. 900-904.</i><br /><br />View This Record in Scopus Two-Dimensional Motion of Idealized Grain Boundaries WW Mullins Journal of Applied Physics, Vol. 27, No. 8. (1956), pp. 900-904. 2008-05-09T21:44:58-00:00 1956 Journal of Applied Physics 27 8 900 904 AIP bcp http://www.citeulike.org/user/dwinston/article/2782327 <i>Polymeric Materials Science and Engineering, Vol. 93 (Fall 2005)</i><br /><br />Thin films of block copolymers (BC) are the focus of intensive investigations due to their self-assembly into well-ordered periodic structures. 1) In the present work, we investigate the microdomain morphology in symmetric PS-b-PMMA diblock copolymer thin films 'annealed' by different selective solvents vapor. 2, 3) PMMA hexagonally cylindrical microdomains oriented normal to the surface (Fig. 1a) can form by tuning the film thickness (less than L o ), the solvent selectivity (selective for PMMA) and solvent annealing time. Thickness confinement and solvent induced the change of film boundary condition are shown to be responsible for the formation of morphology. The resulted nanostructured films turn out to be sensitive to the surrounding medium, i.e., their morphologies and surface properties can be reversibly switchable upon exposure to solvent vapor selective for PS (Fig. 1b). Furthermore, by mixing the symmetric BC with homopolymers and block copolymer, the cylindrical domain sizes can be continuously tuned. Solvent-Induced Ordering in Diblock Copolymer Thin Films Juan Peng Yu Xuan Binyao Li Yanchun Han Polymeric Materials Science and Engineering, Vol. 93 (Fall 2005) 2008-05-10T04:05:12-00:00 2005 Polymeric Materials Science and Engineering 93 bcp self-assembly templated http://www.citeulike.org/user/dwinston/article/2782248 <i>Annual Review of Materials Research, Vol. 31, No. 1. (2001), pp. 323-355.</i><br /><br />Abstract A two-part review of research concerning block copolymer thin films is presented. The first section summarizes experimental and theoretical studies of the fundamental physics of these systems, concentrating upon the forces that govern film morphology. The role of film thickness and surface energetics on the morphology of compositionally symmetric, amorphous diblock copolymer films is emphasized, including considerations of boundary condition symmetry, so-called hybrid structures, and surface chemical expression. Discussions of compositionally asymmetric systems and emerging research areas, e.g., liquid-crystalline and A-B-C triblock systems, are also included. In the second section, technological applications of block copolymer films, e.g., as lithographic masks and photonic materials, are considered. Particular attention is paid to means by which microphase domain order and orientation can be controlled, including exploitation of thickness and surface effects, the application of external fields, and the use of patterned substrates. BLOCK COPOLYMER THIN FILMS: Physics and Applications Michael Fasolka Anne Mayes doi:10.1146/annurev.matsci.31.1.323 Annual Review of Materials Research, Vol. 31, No. 1. (2001), pp. 323-355. 2008-05-10T02:02:55-00:00 2001 Annual Review of Materials Research 31 1 323 355 bcp self-assembly templated http://www.citeulike.org/user/dwinston/article/440524 <i>Science, Vol. 295, No. 5564. (29 March 2002), pp. 2418-2421.</i><br /><br />Self-assembly is the autonomous organization of components into patterns or structures without human intervention. Self-assembling processes are common throughout nature and technology. They involve components from the molecular (crystals) to the planetary (weather systems) scale and many different kinds of interactions. The concept of self-assembly is used increasingly in many disciplines, with a different flavor and emphasis in each. Self-assembly at all scales. GM Whitesides B Grzybowski doi:10.1126/science.1070821 Science, Vol. 295, No. 5564. (29 March 2002), pp. 2418-2421. 2005-12-17T14:15:26-00:00 2002 Science 1095-9203 295 5564 2418 2421 self-assembly http://www.citeulike.org/user/dwinston/article/2776723 <i>Accounts of Chemical Research, Vol. 8, No. 9. (1975), pp. 295-299.</i> Block copolymers, polymer-polymer interfaces, and the theory of inhomogeneous polymers Eugene Helfand Accounts of Chemical Research, Vol. 8, No. 9. (1975), pp. 295-299. 2008-05-09T21:54:16-00:00 1975 Accounts of Chemical Research 8 9 295 299 bcp self-assembly http://www.citeulike.org/user/dwinston/article/2746852 <i>Applied Physics Letters, Vol. 92, No. 14. (2008)</i> Impact of template variations on shape and arrangement of Si/Ge quantum dot arrays C Dais HH Solak E Müller D Grützmacher Applied Physics Letters, Vol. 92, No. 14. (2008) 2008-05-02T19:20:20-00:00 2008 Applied Physics Letters 92 14 AIP self-assembly templated http://www.citeulike.org/user/dwinston/article/2675186 <i>Advanced Materials, Vol. 15, No. 19. (2003), pp. 1599-1602.</i><br /><br />No abstract. Templated Self-Assembly of Block Copolymers: Effect of Substrate Topography JY Cheng CA Ross EL Thomas HI Smith GJ Vancso doi:10.1002/adma.200305244 Advanced Materials, Vol. 15, No. 19. (2003), pp. 1599-1602. 2008-04-15T19:20:27-00:00 2003 Advanced Materials 15 19 1599 1602 jclub