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Group: quantum - with tag optical [8 articles]

グループ quantum のメンバーが最近追加した論文の一覧 with tag optical
  • Sub-30-nm hybrid lithography (electron beam/deep ultraviolet) and etch process for fully depleted metal oxide semiconductor transistors
    Vol. 25, No. 6. (2007), pp. 2030-2033.
    by Pauliac S Vaujour, P Brianceau, S Landis, J Chiaroni, O Faynot
    posted to optical lithography by dwinston to the group quantum on 2008-05-14 12:37:28 as **
  • Three-dimensional nanoscale subsurface optical imaging of silicon circuits
    Applied Physics Letters, Vol. 90, No. 13. (2007)
    by E Ramsay, KA Serrels, MJ Thomson, AJ Waddie, MR Taghizadeh, RJ Warburton, DT Reid
    posted to vlsi optical microscopy 6781 by karlberggren to the group quantum on 2007-04-06 15:18:54 as ***
  • Hybrid optical maskless lithography: Scaling beyond the 45 nm node
    Vol. 23, No. 6. (2005), pp. 2743-2748.
    by M Fritze, TM Bloomstein, B Tyrrell, TH Fedynyshyn, Jr, DE Hardy, S Cann, D Lennon, S Spector, M Rothschild, P Brooker
    posted to subresolution optical lithography 6781 by karlberggren to the group quantum on 2007-04-02 16:47:17 as read
  • Gratings of regular arrays and trim exposures for ultralarge scale integrated circuit phase-shift lithography
    The 45th international conference on electron, ion, and photon beam technology and nanofabrication, Vol. 19, No. 6. (2001), pp. 2366-2370.
    by M Fritze, B Tyrrell, D Astolfi, D Yost, P Davis, B Wheeler, R Mallen, J Jarmolowicz, S Cann, D Chan, P Rhyins, C Carney, J Ferri, BA Blachowicz
    posted to subresolution optical lithography 6781 by karlberggren to the group quantum on 2007-04-02 16:45:49 as read
  • Magnifying Superlens in the Visible Frequency Range
    Science, Vol. 315, No. 5819. (23 March 2007), pp. 1699-1701.
    by Igor I Smolyaninov, Yu-Ju Hung, Christopher C Davis
    posted to plasmonics optical nanooptics microscopy by karlberggren to the group quantum on 2007-03-30 17:10:57 as ***
  • Far-Field Optical Hyperlens Magnifying Sub-Diffraction-Limited Objects
    Science, Vol. 315, No. 5819. (23 March 2007), 1686.
    by Zhaowei Liu, Hyesog Lee, Yi Xiong, Cheng Sun, Xiang Zhang
    posted to plasmonics optical nanooptics lithography by karlberggren to the group quantum on 2007-03-30 17:09:17 as ***
  • Instrumentation for conformable photomask lithography
    Electron Devices, IEEE Transactions on, Vol. 22, No. 7. (1975), pp. 496-498.
    by J Melngailis, HI Smith, N Efremow
    posted to superresolution optical lithography 6781 by karlberggren to the group quantum on 2007-03-30 14:15:07 as ***
  • Scanning near-field optical lithography
    Thin Solid Films, Vol. 264, No. 2. (1995)
    by S Wegscheider, A Kirsch, J Mlynek, G Krausch
    posted to superresolution optical near-field lithography by karlberggren to the group quantum on 2005-07-17 20:26:37 as **
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