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Group: quantum - with tag lithography [45 articles]

グループ quantum のメンバーが最近追加した論文の一覧 with tag lithography
  • Sub-30-nm hybrid lithography (electron beam/deep ultraviolet) and etch process for fully depleted metal oxide semiconductor transistors
    Vol. 25, No. 6. (2007), pp. 2030-2033.
    by Pauliac S Vaujour, P Brianceau, S Landis, J Chiaroni, O Faynot
    posted to optical lithography by dwinston to the group quantum on 2008-05-14 12:37:28 as **
  • Capturing and depositing one nanoobject at a time: Single particle dip-pen nanolithography
    Applied Physics Letters, Vol. 90, No. 13. (2007)
    by Ying Wang, Yi Zhang, Bin Li, Junhong Lu, Jun Hu
    posted to quantum-dot lithography afm by karlberggren to the group quantum on 2007-04-06 15:13:44 as ***
  • Hybrid optical maskless lithography: Scaling beyond the 45 nm node
    Vol. 23, No. 6. (2005), pp. 2743-2748.
    by M Fritze, TM Bloomstein, B Tyrrell, TH Fedynyshyn, Jr, DE Hardy, S Cann, D Lennon, S Spector, M Rothschild, P Brooker
    posted to subresolution optical lithography 6781 by karlberggren to the group quantum on 2007-04-02 16:47:17 as read
  • Gratings of regular arrays and trim exposures for ultralarge scale integrated circuit phase-shift lithography
    The 45th international conference on electron, ion, and photon beam technology and nanofabrication, Vol. 19, No. 6. (2001), pp. 2366-2370.
    by M Fritze, B Tyrrell, D Astolfi, D Yost, P Davis, B Wheeler, R Mallen, J Jarmolowicz, S Cann, D Chan, P Rhyins, C Carney, J Ferri, BA Blachowicz
    posted to subresolution optical lithography 6781 by karlberggren to the group quantum on 2007-04-02 16:45:49 as read
  • Far-Field Optical Hyperlens Magnifying Sub-Diffraction-Limited Objects
    Science, Vol. 315, No. 5819. (23 March 2007), 1686.
    by Zhaowei Liu, Hyesog Lee, Yi Xiong, Cheng Sun, Xiang Zhang
    posted to plasmonics optical nanooptics lithography by karlberggren to the group quantum on 2007-03-30 17:09:17 as ***
  • Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography
    Optics Express, Vol. 15, No. 6. (2007), pp. 3465-3469.
    by PW Wachulak, MG Capeluto, MC Marconi, CS Menoni, JJ Rocca
    posted to lithography interferometric euv 6781 by karlberggren to the group quantum on 2007-03-30 17:06:38 as ***
  • Instrumentation for conformable photomask lithography
    Electron Devices, IEEE Transactions on, Vol. 22, No. 7. (1975), pp. 496-498.
    by J Melngailis, HI Smith, N Efremow
    posted to superresolution optical lithography 6781 by karlberggren to the group quantum on 2007-03-30 14:15:07 as ***
  • Finer features for functional microdevices
    Nature, Vol. 412, No. 6848. (2001/08/16)
    by S Kawata, Hong B Sun, T Tanaka, K Takada
    posted to lithography lithography--optical lithography--two-photon by karlberggren to the group quantum on 2005-07-17 23:57:50 as **
  • The rational design of bleachable non-chemically amplified DUV photoactive compounds
    Proceedings of the SPIE - The International Society for Optical Engineering, Vol. 4345, No. pt.1-2. (2001//)
    by BM Rathsack, PI Tattersall, CE Tabery, K Lou, TB Stachowiak, DR Medeiros, JA Albeo, PY Pirogovsky, DR Mckean, CG Willson
    posted to lithography lithography--optical lithography--photoresist by karlberggren to the group quantum on 2005-07-17 23:18:17 as **
  • Deep-ultraviolet contact photolithography
    Microelectronic Engineering, Vol. 53, No. 1-4. (2000/06/)
    by JG Goodberlet, BL Dunn
    posted to lithography lithography--optical by karlberggren to the group quantum on 2005-07-17 20:29:50 as **
  • Scanning near-field optical lithography
    Thin Solid Films, Vol. 264, No. 2. (1995)
    by S Wegscheider, A Kirsch, J Mlynek, G Krausch
    posted to superresolution optical near-field lithography by karlberggren to the group quantum on 2005-07-17 20:26:37 as **
  • Diazonaphthoquinone-based Resists (Tutorial Texts in Optical Engineering Vol. TT11) (Tutorial Texts in Optical Engineering, Vol Tt 11)
    (15 February 1993)
    by Ralph Dammel
    posted to lithography lithography--photoresists by karlberggren to the group quantum on 2005-07-17 16:26:47 as read
  • Electron beam lithography for complex high density devices
    Journal of the Electrochemical Society, Vol. 121, No. 3. (1974/03/)
    by THP Chang, AD Wilson, AJ Speth, A Kern
    posted to lithography lithography--ebeam by karlberggren to the group quantum on 2005-07-16 18:08:27 as **
  • A high quantum yield diarylethene-backbone photochromic polymer
    Advanced Materials, Vol. 11, No. 4. (1999/03/04)
    by F Stellacci, C Bertarelli, F Toscano, MC Gallazzi, G Zotti, G Zerbi
    posted to chemistry lithography lithography--nodal by karlberggren to the group quantum on 2005-07-14 22:36:23 as **
  • Quantum lithography by coherent control of classical light pulses
    Optics Express, Vol. 12, No. 26. (2004/12/27)
    by A Pe'er, B Dayan, M Vucelja, Y Silberg, AA Friesem
    posted to lithography lithography--optical lithography--superresolution lithography--two-photon by karlberggren to the group quantum on 2005-07-14 21:42:13 as **
  • Positioning single atoms with a scanning tunnelling microscope
    Nature, Vol. 344, No. 6266. (1990/04/05)
    by DM Eigler, EK Schweizer
    posted to lithography lithography--atomic lithography--scanning-probe by karlberggren to the group quantum on 2005-07-14 21:27:05 as **
  • Subwavelength nanolithography using surface plasmons
    2003 Third IEEE Conference on Nanotechnology. IEEE-NANO 2003. Proceedings (Cat. No.03TH8700), Vol. vol. 2 (2003//)
    by W Srituravanich, N Fang, C Sun, Q Luo, X Zhang
    posted to lithography lithography--plasmonic by karlberggren to the group quantum on 2005-07-14 21:17:56 as **
  • Plasmon printing - a new approach to near-field lithography
    Nanopatterning - From Ultralarge-Scale Integration to Biotechnology. Symposium (Materials Research Society Symposium Proceedings Vol.705) (2002//)
    by PG Kik, SA Maier, HA Atwater
    posted to lithography lithography--plasmonic by karlberggren to the group quantum on 2005-07-14 21:03:56 as **
  • Surface-enhanced optical microscopy
    Journal of the Optical Society of America B (Optical Physics), Vol. 2, No. 9. (Sept. 1985)
    by J Wessel
    posted to lithography lithography--plasmonic microscopy by karlberggren to the group quantum on 2005-07-14 20:58:03 as **
  • Two-photon lithography for microelectronic application
    Proceedings of the SPIE - The International Society for Optical Engineering, Vol. 1674, No. pt.2. (1992//)
    by ES Wu, JH Strickler, WR Harrell, WW Webb
    posted to lithography lithography--optical lithography--superresolution lithography--two-photon by karlberggren to the group quantum on 2005-07-14 20:48:31 as **
  • Imaging through planar silver lenses in the optical near field
    Journal of Optics A: Pure and Applied Optics, Vol. 7, No. 2. (2005/02/)
    by RJ Blaikie, DOS Melville
    posted to lithography lithography--plasmonic negative-index by karlberggren to the group quantum on 2005-07-14 19:50:27 as **
  • Strategy for far-field optical imaging and writing without diffraction limit
    Physics Letters A, Vol. 326, No. 1-2. (2004/05/31)
    by SW Hell
    posted to lithography lithography--nodal lithography--optical lithography--superresolution by karlberggren to the group quantum on 2005-07-14 19:46:04 as **
  • Near-perfect imaging in a focusing system based on a left-handed-material plate
    Physical Review Letters, Vol. 92, No. 7. (2004/02/20)
    by AN Lagarkov, VN Kissel
    posted to lithography lithography--optical lithography--superresolution metamaterials negative-index by karlberggren to the group quantum on 2005-07-14 19:00:00 as **
  • Imaging and writing at the nanoscale with focused visible light through saturable optical transitions
    Applied Physics A: Materials Science and Processing, Vol. 77, No. 7. (2003)
    by SW Hell, S Jakobs, L Kastrup
    posted to lithography lithography--nodal lithography--optical lithography--superresolution by karlberggren to the group quantum on 2005-07-14 18:53:38 as **
  • Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit
    Physical Review Letters, Vol. 85, No. 13. (25 Sept. 2000)
    by AN Boto, P Kok, DS Abrams, SL Braunstein, CP Williams, JP Dowling
    posted to lithography lithography--optical lithography--quantum lithography--superresolution quantum-optics by karlberggren to the group quantum on 2005-07-14 18:17:23 as **
  • Comment on "Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit"
    Physical Review Letters, Vol. 86, No. 7. (2001/02/12)
    by GS Agarwal, RW Boyd, EM Nagasako, SJ Bentley
    posted to lithography lithography--optical lithography--quantum lithography--superresolution quantum-optics by karlberggren to the group quantum on 2005-07-14 18:14:36 as **
  • Nanometer definition of atomic beams with masks of light
    Technical Digest. Summaries of Papers Presented at the International Quantum Electronics Conference. Conference Edition. 1998 Technical Digest Series, Vol.7 (IEEE Cat. No.98CH36236) (1998//)
    by R Abfalterer, S Bernet, C Keller, MK Oberthaler, J Schmiedmayer, A Zeilinger
    posted to atomic-physics lithography lithography--neutral-atom lithography--nodal by karlberggren to the group quantum on 2005-07-14 18:10:35 as **
  • Maskless Lithography
    Materials Today (February 2005)
    by Rajesh Menon, Amil Patel, Dario Gil, Henry Smith
    posted to lithography lithography--direct-write lithography--optical by karlberggren to the group quantum on 2005-07-14 16:40:08 as **
  • Zone-plate-array lithography (ZPAL): a maskless fast-turn-around system for microoptic device fabrication
    Proceedings of the SPIE - The International Society for Optical Engineering, Vol. 4984 (2003//)
    by R Menon, D Gil, DJD Carter, A Patel, HI Smith
    posted to direct lithography plate write zone zpal by karlberggren to the group quantum on 2005-07-14 16:37:46 as **
  • Parallel maskless optical lithography for prototyping, low-volume production, and research
    Journal of Vacuum Science & Technology B (Microelectronics and Nanometer Structures), Vol. 20, No. 6. (2002/11/)
    by D Gil, R Menon, Xudong Tang, HI Smith, DJD Carter
    posted to lithography lithography--direct-write lithography--optical by karlberggren to the group quantum on 2005-07-14 16:30:18 as **
  • Immersion liquids for lithography in the deep ultraviolet
    Proceedings of the SPIE - The International Society for Optical Engineering, Vol. 5040, No. 1. (2003//)
    by M Switkes, RR Kunz, RF Sinta, M Rothschild, Gallagher PM Wetmore, VJ Krukonis, K Williams
    posted to lithography lithography--immersion lithography--optical by karlberggren to the group quantum on 2005-07-14 16:24:59 as **
  • Extending optics to 50 nm and beyond with immersion lithography
    Journal of Vacuum Science & Technology B (Microelectronics and Nanometer Structures), Vol. 21, No. 6. (2003/11/)
    by M Switkes, RR Kunz, M Rothschild, RF Sinta, M Yeung, SY Baek
    posted to lithography lithography--imersion lithography--optical by karlberggren to the group quantum on 2005-07-14 16:24:17 as **
  • Photoresist outgassing: a potential Achilles heel for short-wavelength optical lithography?
    Proceedings of the SPIE - The International Society for Optical Engineering, Vol. 5376, No. 1. (2004//)
    by RR Kunz
    posted to lithography lithography--photoresists by karlberggren to the group quantum on 2005-07-14 16:20:44 as **
  • Optical projection lithography at half the Rayleigh resolution limit by two-photon exposure
    Optical Engineering, Vol. 38, No. 2. (February 1999), pp. 334-338.
    by Eli Yablonovitch, Rutger B Vrijen
    posted to lithography lithography--optical lithography--two-photon by karlberggren to the group quantum on 2005-07-01 16:13:38 as **
  • Twofold spatial resolution enhancement by two-photon exposure of photographic film
    Optical Engineering, Vol. 38 (1999), pp. 334-338.
    by DV Korobkin, E Yablonovitch
    posted to lithography lithography--optical lithography--two-photon by karlberggren to the group quantum on 2005-06-20 18:51:51 as **
  • Resonant Optical Antennas
    Science, Vol. 308, No. 5728. (10 June 2005), pp. 1607-1609.
    by P Muhlschlegel, H Eisler, O Martin, B Hecht, D Pohl
    posted to lithography optics plasmonics by karlberggren to the group quantum on 2005-06-20 17:06:51 as read along with 2 people mankei skirnir
  • Temporal coherent control in two-photon transitions: from optical interferences to quantum interferences
    Physical Review Letters, Vol. 78, No. 14. (1997/04/07)
    by V Blanchet, C Nicole, MA Bouchene, B Girard
    posted to lithography lithography--quantum quantum-optics by karlberggren to the group quantum on 2005-06-15 14:51:27 as **
  • Light-induced shape-memory polymers
    Nature, Vol. 434 (14 April 2005), pp. 879-882.
    by Andreas Lendlein, Hongyan Jiang, Oliver Junger, Robert Langer
    posted to nanoimprint materials lithography by karlberggren to the group quantum on 2005-06-03 12:55:14 as read
  • Influence of sub-100 nm scattering on high-energy electron beam lithography
    Journal of Vacuum Science & Technology B (Microelectronics and Nanometer Structures), Vol. 19, No. 6. (2001/11/)
    by E Anderson, D Olynick, W Chao, B Harteneck, E Veklerov
    posted to lithography lithography--ebeam by karlberggren to the group quantum on 2005-05-31 16:20:33 as read
  • A lift-off process for high resolution patterns using PMMA/LOR resist stack
    Microelectronic Engineering, Vol. 73-74 (2004/06/)
    by Yifang Chen, Kaiwu Peng, Zheng Cui
    posted to lithography lithography--liftoff by karlberggren to the group quantum on 2005-05-31 16:07:28 as read
  • Development of three-dimensional pattern-generating system for focused-ion-beam chemical-vapor deposition
    Journal of Vacuum Science & Technology B (Microelectronics and Nanometer Structures), Vol. 21, No. 6. (2003/11/)
    by T Hoshino, K Watanabe, R Kometani, T Morita, K Kanda, Y Haruyama, T Kaito, J Fujita, M Ishida, Y Ochiai, S Matsui
    posted to lithography lithography--3d lithography--fib by karlberggren to the group quantum on 2005-05-04 16:13:07 as **
  • Focused ion beam methods of nanofabrication: room at the bottom
    Proceedings of the SPIE - The International Society for Optical Engineering, Vol. 4510 (2001//)
    by R Gerlach, M Utlaut
    posted to lithography lithography--fib by karlberggren to the group quantum on 2005-05-04 15:51:11 as ***
  • A model for comparing process latitude in ultraviolet, deep-ultraviolet, and X-ray lithography
    Journal of Vacuum Science & Technology B (Microelectronics Processing and Phenomena), Vol. 6, No. 1. (1988/01/)
    by H Smith
    posted to lithography by karlberggren to the group quantum on 2005-04-28 10:11:20 as **
  • A new interferometric displacement-detection method for mask-to-wafer alignment using symmetrically-arranged three gratings
    Japanese Journal of Applied Physics, Part 2 (Letters), Vol. 25, No. 6. (1986/06/)
    by J Itoh, T Kanayama
    posted to lithography lithography--alignment by karlberggren to the group quantum on 2005-04-22 22:14:09 as **
  • Step and flash imprint lithography: Template surface treatment and defect analysis
    Journal of Vacuum Science & Technology B (Microelectronics and Nanometer Structures), Vol. 18, No. 6. (November 2000)
    by T Bailey, B Choi, M Colburn, M Meissl, S Shaya, J Ekerdt, S Sreenivasan, C Willson
    posted to step-and-flash sfil nanoimprint lithography havepdf cleaning by karlberggren to the group quantum on 2005-04-21 10:48:33 as read
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