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Group: quantum - library [108 articles]

グループ quantum のメンバーが最近追加した論文の一覧
  • Sub-30-nm hybrid lithography (electron beam/deep ultraviolet) and etch process for fully depleted metal oxide semiconductor transistors
    Vol. 25, No. 6. (2007), pp. 2030-2033.
    by Pauliac S Vaujour, P Brianceau, S Landis, J Chiaroni, O Faynot
    posted to optical lithography by dwinston to the group quantum on 2008-05-14 12:37:28 as **
  • Impact of template variations on shape and arrangement of Si/Ge quantum dot arrays
    Applied Physics Letters, Vol. 92, No. 14. (2008)
    by C Dais, HH Solak, E Müller, D Grützmacher
    posted to templated self-assembly by dwinston to the group quantum on 2008-05-02 20:22:08 as read
  • Superconducting nanowire photonnumber- resolving detector at telecommunication wavelengths
    by Aleksander Divochiy, Francesco Marsili, David Bitauld, Alessandro Gaggero, Roberto Leoni, Francesco Mattioli, Alexander Korneev, Vitaliy Seleznev, Nataliya Kaurova, OLGA Minaeva, Gregory Gol’tsman, Konstantinos G Lagoudakis, Moushab Benkhaoul, Francis L Vy, Andrea Fiore
    posted to no-tag by karlberggren to the group quantum on 2008-04-29 20:35:31 as **
  • Three-dimensional nanoscale subsurface optical imaging of silicon circuits
    Applied Physics Letters, Vol. 90, No. 13. (2007)
    by E Ramsay, KA Serrels, MJ Thomson, AJ Waddie, MR Taghizadeh, RJ Warburton, DT Reid
    posted to vlsi optical microscopy 6781 by karlberggren to the group quantum on 2007-04-06 15:18:54 as ***
  • Capturing and depositing one nanoobject at a time: Single particle dip-pen nanolithography
    Applied Physics Letters, Vol. 90, No. 13. (2007)
    by Ying Wang, Yi Zhang, Bin Li, Junhong Lu, Jun Hu
    posted to quantum-dot lithography afm by karlberggren to the group quantum on 2007-04-06 15:13:44 as ***
  • Hybrid optical maskless lithography: Scaling beyond the 45 nm node
    Vol. 23, No. 6. (2005), pp. 2743-2748.
    by M Fritze, TM Bloomstein, B Tyrrell, TH Fedynyshyn, Jr, DE Hardy, S Cann, D Lennon, S Spector, M Rothschild, P Brooker
    posted to subresolution optical lithography 6781 by karlberggren to the group quantum on 2007-04-02 16:47:17 as read
  • Gratings of regular arrays and trim exposures for ultralarge scale integrated circuit phase-shift lithography
    The 45th international conference on electron, ion, and photon beam technology and nanofabrication, Vol. 19, No. 6. (2001), pp. 2366-2370.
    by M Fritze, B Tyrrell, D Astolfi, D Yost, P Davis, B Wheeler, R Mallen, J Jarmolowicz, S Cann, D Chan, P Rhyins, C Carney, J Ferri, BA Blachowicz
    posted to subresolution optical lithography 6781 by karlberggren to the group quantum on 2007-04-02 16:45:49 as read
  • Magnifying Superlens in the Visible Frequency Range
    Science, Vol. 315, No. 5819. (23 March 2007), pp. 1699-1701.
    by Igor I Smolyaninov, Yu-Ju Hung, Christopher C Davis
    posted to plasmonics optical nanooptics microscopy by karlberggren to the group quantum on 2007-03-30 17:10:57 as ***
  • Far-Field Optical Hyperlens Magnifying Sub-Diffraction-Limited Objects
    Science, Vol. 315, No. 5819. (23 March 2007), 1686.
    by Zhaowei Liu, Hyesog Lee, Yi Xiong, Cheng Sun, Xiang Zhang
    posted to plasmonics optical nanooptics lithography by karlberggren to the group quantum on 2007-03-30 17:09:17 as ***
  • Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography
    Optics Express, Vol. 15, No. 6. (2007), pp. 3465-3469.
    by PW Wachulak, MG Capeluto, MC Marconi, CS Menoni, JJ Rocca
    posted to lithography interferometric euv 6781 by karlberggren to the group quantum on 2007-03-30 17:06:38 as ***
  • Instrumentation for conformable photomask lithography
    Electron Devices, IEEE Transactions on, Vol. 22, No. 7. (1975), pp. 496-498.
    by J Melngailis, HI Smith, N Efremow
    posted to superresolution optical lithography 6781 by karlberggren to the group quantum on 2007-03-30 14:15:07 as ***
  • Sharper Focus for a Radially Polarized Light Beam
    Physical Review Letters, Vol. 91, No. 23. (2 December 2003), 233901.
    by R Dorn, S Quabis, G Leuchs
    posted to subresolution optics by karlberggren to the group quantum on 2007-03-28 21:10:14 as read
  • Prospects for electron imaging with ultrafast time resolution
    Applied Physics Letters, Vol. 90, No. 11. (2007)
    by Michael R Armstrong, Bryan W Reed, Ben R Torralva, Nigel D Browning
    posted to microscopy electron-optics 6781 by karlberggren to the group quantum on 2007-03-27 15:19:19 as ***
  • Adaptive subwavelength control of nano-optical fields
    Nature, Vol. 446, No. 7133. (2007), pp. 301-304.
    by Martin Aeschlimann, Michael Bauer, Daniela Bayer, Tobias Brixner, Javier, Walter Pfeiffer, Martin Rohmer, Christian Spindler, Felix Steeb
    posted to plasmonics optics nanooptics evolutionary-algorithms by karlberggren to the group quantum on 2007-03-27 15:19:19 as ***
  • Integration of Colloidal Nanocrystals into Lithographically Patterned Devices
    Nano Letters, Vol. 4, No. 6. (2004), pp. 1093-1098.
    by Yi
    posted to quantum-dots by karlberggren to the group quantum on 2006-12-04 17:04:14 as read
  • Functionalized Nanostructures with Liquid-Like Behavior: Expanding the Gallery of Available Nanostructures
    Advanced Functional Materials, Vol. 15, No. 8. (2005), pp. 1285-1290.
    by A B Bourlinos, S Ray chowdhury, R Herrera, D D Jiang, Q Zhang, L A Archer, E P Giannelis
    posted to high-index liquid-like nanodots by karlberggren to the group quantum on 2006-11-22 19:53:58 as read
  • True atomic resolution in liquid by frequency-modulation atomic force microscopy
    Applied Physics Letters, Vol. 87, No. 3. (2005)
    by Takeshi Fukuma, Kei Kobayashi, Kazumi Matsushige, Hirofumi Yamada
    posted to afm metrology by karlberggren to the group quantum on 2005-10-28 14:48:13 as ** along with 1 person hearoplane
  • High T[sub c] superconducting NbN films deposited at room temperature
    Journal of Applied Physics, Vol. 58, No. 12. (1985), pp. 4643-4648.
    by S Thakoor, JL Lamb, AP Thakoor, SK Khanna
    posted to materials nbn niobium nitride by karlberggren to the group quantum on 2005-10-27 20:12:20 as **
  • Universal control of decoupled quantum systems
    Physical Review Letters, Vol. 83, No. 23. (1999/12/06)
    by L Viola, S Lloyd, E Knill
    posted to quantum-computing quantum-computing--control by karlberggren to the group quantum on 2005-10-02 22:12:30 as **
  • Design of strongly modulating pulses to implement precise effective Hamiltonians for quantum information processing
    Journal of Chemical Physics, Vol. 116, No. 17. (2002/05/01)
    by EM Fortunato, MA Pravia, N Boulant, G Teklemariam, TF Havel, DG Cory
    posted to quantum-computing quantum-computing--nmr by karlberggren to the group quantum on 2005-09-26 00:31:33 as ***
  • Femtosecond photomagnetic switching of spins in ferrimagnetic garnet films
    Physical Review Letters, Vol. 95, No. 4. (2005/07/22)
    by F Hansteen, A Kimel, A Kirilyuk, T Rasing
    posted to devices devices--spin by karlberggren to the group quantum on 2005-09-20 20:19:27 as **
  • All-Optical Subpicosecond Magnetic Switching in NiO(001)
    Physical Review Letters, Vol. 92, No. 22. (2004)
    by Gomez R Abal, O Ney, K Satitkovitchai, W Hubner
    posted to devices devices--magnetic devices--spin by karlberggren to the group quantum on 2005-09-20 20:15:26 as **
  • Ultrafast precessional magnetization reversal by picosecond magnetic field pulse shaping
    Nature, Vol. 418, No. 6897. (2002/08/01)
    by T Gerrits, HAM van den Berg, J Hohlfeld, L Bar, T Rasing
    posted to devices devices--magnetic devices--spin by karlberggren to the group quantum on 2005-09-20 19:58:53 as **
  • The characteristic electron-phonon coupling time of unconventional superconductors and implications for optical detectors
    Superconductor Science & Technology, Vol. 18, No. 9. (Sept. 2005)
    by L Parlato, R Latempa, G Peluso, GP Pepe, R Cristiano, R Sobolewski
    posted to photodetectors photodetectors-sspd by karlberggren to the group quantum on 2005-09-20 19:43:08 as **
  • Finer features for functional microdevices
    Nature, Vol. 412, No. 6848. (2001/08/16)
    by S Kawata, Hong B Sun, T Tanaka, K Takada
    posted to lithography lithography--optical lithography--two-photon by karlberggren to the group quantum on 2005-07-17 23:57:50 as **
  • The rational design of bleachable non-chemically amplified DUV photoactive compounds
    Proceedings of the SPIE - The International Society for Optical Engineering, Vol. 4345, No. pt.1-2. (2001//)
    by BM Rathsack, PI Tattersall, CE Tabery, K Lou, TB Stachowiak, DR Medeiros, JA Albeo, PY Pirogovsky, DR Mckean, CG Willson
    posted to lithography lithography--optical lithography--photoresist by karlberggren to the group quantum on 2005-07-17 23:18:17 as **
  • Nanoscale resolution in the focal plane of an optical microscope
    Physical Review Letters, Vol. 94, No. 14. (2005/04/15)
    by V Westphal, SW Hell
    posted to fluorescenceoptical focusingoptical microscopesoptical power resolving bibtex-import by karlberggren to the group quantum on 2005-07-17 20:55:45 as **
  • Breaking the diffraction resolution limit by stimulated emission: stimulated-emission-depletion fluorescence microscopy
    Optics Letters, Vol. 19, No. 11. (1994)
    by Stefan W Hell, Jan Wichmann
    posted to microscopy by karlberggren to the group quantum on 2005-07-17 20:53:29 as **
  • Deep-ultraviolet contact photolithography
    Microelectronic Engineering, Vol. 53, No. 1-4. (2000/06/)
    by JG Goodberlet, BL Dunn
    posted to lithography lithography--optical by karlberggren to the group quantum on 2005-07-17 20:29:50 as **
  • Scanning near-field optical lithography
    Thin Solid Films, Vol. 264, No. 2. (1995)
    by S Wegscheider, A Kirsch, J Mlynek, G Krausch
    posted to superresolution optical near-field lithography by karlberggren to the group quantum on 2005-07-17 20:26:37 as **
  • Diazonaphthoquinone-based Resists (Tutorial Texts in Optical Engineering Vol. TT11) (Tutorial Texts in Optical Engineering, Vol Tt 11)
    (15 February 1993)
    by Ralph Dammel
    posted to lithography lithography--photoresists by karlberggren to the group quantum on 2005-07-17 16:26:47 as read
  • Electron beam lithography for complex high density devices
    Journal of the Electrochemical Society, Vol. 121, No. 3. (1974/03/)
    by THP Chang, AD Wilson, AJ Speth, A Kern
    posted to lithography lithography--ebeam by karlberggren to the group quantum on 2005-07-16 18:08:27 as **
  • A high quantum yield diarylethene-backbone photochromic polymer
    Advanced Materials, Vol. 11, No. 4. (1999/03/04)
    by F Stellacci, C Bertarelli, F Toscano, MC Gallazzi, G Zotti, G Zerbi
    posted to chemistry lithography lithography--nodal by karlberggren to the group quantum on 2005-07-14 22:36:23 as **
  • Quantum lithography by coherent control of classical light pulses
    Optics Express, Vol. 12, No. 26. (2004/12/27)
    by A Pe'er, B Dayan, M Vucelja, Y Silberg, AA Friesem
    posted to lithography lithography--optical lithography--superresolution lithography--two-photon by karlberggren to the group quantum on 2005-07-14 21:42:13 as **
  • Positioning single atoms with a scanning tunnelling microscope
    Nature, Vol. 344, No. 6266. (1990/04/05)
    by DM Eigler, EK Schweizer
    posted to lithography lithography--atomic lithography--scanning-probe by karlberggren to the group quantum on 2005-07-14 21:27:05 as **
  • Subwavelength nanolithography using surface plasmons
    2003 Third IEEE Conference on Nanotechnology. IEEE-NANO 2003. Proceedings (Cat. No.03TH8700), Vol. vol. 2 (2003//)
    by W Srituravanich, N Fang, C Sun, Q Luo, X Zhang
    posted to lithography lithography--plasmonic by karlberggren to the group quantum on 2005-07-14 21:17:56 as **
  • Nonlinear optical processes using electromagnetically induced transparency
    Physical Review Letters, Vol. 64, No. 10. (1990/03/05)
    by SE Harris, JE Field, A Imamoglu
    posted to atomic-physics quantum-optics by karlberggren to the group quantum on 2005-07-14 21:14:30 as **
  • Observation of coherent optical information storage in an atomic medium using halted light pulses
    Nature, Vol. 409, No. 6819. (2001/01/25)
    by Chien Liu, Z Dutton, CH Behroozi, LV Hau
    posted to atomic-physics quantum-optics by karlberggren to the group quantum on 2005-07-14 21:10:48 as **
  • Plasmon printing - a new approach to near-field lithography
    Nanopatterning - From Ultralarge-Scale Integration to Biotechnology. Symposium (Materials Research Society Symposium Proceedings Vol.705) (2002//)
    by PG Kik, SA Maier, HA Atwater
    posted to lithography lithography--plasmonic by karlberggren to the group quantum on 2005-07-14 21:03:56 as **
  • Surface-enhanced optical microscopy
    Journal of the Optical Society of America B (Optical Physics), Vol. 2, No. 9. (Sept. 1985)
    by J Wessel
    posted to lithography lithography--plasmonic microscopy by karlberggren to the group quantum on 2005-07-14 20:58:03 as **
  • Two-photon lithography for microelectronic application
    Proceedings of the SPIE - The International Society for Optical Engineering, Vol. 1674, No. pt.2. (1992//)
    by ES Wu, JH Strickler, WR Harrell, WW Webb
    posted to lithography lithography--optical lithography--superresolution lithography--two-photon by karlberggren to the group quantum on 2005-07-14 20:48:31 as **
  • Imaging through planar silver lenses in the optical near field
    Journal of Optics A: Pure and Applied Optics, Vol. 7, No. 2. (2005/02/)
    by RJ Blaikie, DOS Melville
    posted to lithography lithography--plasmonic negative-index by karlberggren to the group quantum on 2005-07-14 19:50:27 as **
  • Strategy for far-field optical imaging and writing without diffraction limit
    Physics Letters A, Vol. 326, No. 1-2. (2004/05/31)
    by SW Hell
    posted to lithography lithography--nodal lithography--optical lithography--superresolution by karlberggren to the group quantum on 2005-07-14 19:46:04 as **
  • Near-perfect imaging in a focusing system based on a left-handed-material plate
    Physical Review Letters, Vol. 92, No. 7. (2004/02/20)
    by AN Lagarkov, VN Kissel
    posted to lithography lithography--optical lithography--superresolution metamaterials negative-index by karlberggren to the group quantum on 2005-07-14 19:00:00 as **
  • Imaging and writing at the nanoscale with focused visible light through saturable optical transitions
    Applied Physics A: Materials Science and Processing, Vol. 77, No. 7. (2003)
    by SW Hell, S Jakobs, L Kastrup
    posted to lithography lithography--nodal lithography--optical lithography--superresolution by karlberggren to the group quantum on 2005-07-14 18:53:38 as **
  • Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit
    Physical Review Letters, Vol. 85, No. 13. (25 Sept. 2000)
    by AN Boto, P Kok, DS Abrams, SL Braunstein, CP Williams, JP Dowling
    posted to lithography lithography--optical lithography--quantum lithography--superresolution quantum-optics by karlberggren to the group quantum on 2005-07-14 18:17:23 as **
  • Comment on "Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit"
    Physical Review Letters, Vol. 86, No. 7. (2001/02/12)
    by GS Agarwal, RW Boyd, EM Nagasako, SJ Bentley
    posted to lithography lithography--optical lithography--quantum lithography--superresolution quantum-optics by karlberggren to the group quantum on 2005-07-14 18:14:36 as **
  • Nanometer definition of atomic beams with masks of light
    Technical Digest. Summaries of Papers Presented at the International Quantum Electronics Conference. Conference Edition. 1998 Technical Digest Series, Vol.7 (IEEE Cat. No.98CH36236) (1998//)
    by R Abfalterer, S Bernet, C Keller, MK Oberthaler, J Schmiedmayer, A Zeilinger
    posted to atomic-physics lithography lithography--neutral-atom lithography--nodal by karlberggren to the group quantum on 2005-07-14 18:10:35 as **
  • Maskless Lithography
    Materials Today (February 2005)
    by Rajesh Menon, Amil Patel, Dario Gil, Henry Smith
    posted to lithography lithography--direct-write lithography--optical by karlberggren to the group quantum on 2005-07-14 16:40:08 as **
  • Zone-plate-array lithography (ZPAL): a maskless fast-turn-around system for microoptic device fabrication
    Proceedings of the SPIE - The International Society for Optical Engineering, Vol. 4984 (2003//)
    by R Menon, D Gil, DJD Carter, A Patel, HI Smith
    posted to direct lithography plate write zone zpal by karlberggren to the group quantum on 2005-07-14 16:37:46 as **
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