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Group: LTM_LETI_etching - with tag cl2-o2 [12 articles]

グループ LTM_LETI_etching のメンバーが最近追加した論文の一覧 with tag cl2-o2
  • Inductively coupled Cl2/O2 plasma: experimental investigation and modelling
    Vacuum, Vol. 75, No. 11-12. (2004), pp. 237-246.
    by Efremov, Dong-Pyo Kim, Chang-Il Kim
    posted to cl2-o2 icp optical-emission-spectroscopy by these_morel to the group LTM_LETI_etching on 2008-01-30 13:06:03 as read
  • Challenges in metal gate etching for logic applications
    (2003)
    by Shashank Deshmukh, Jinhan Choi, Meihua Shen, Yan Du, Kyeong T Lee, Sang I Yi, Jae B Yu, Thorsten Lill
    posted to cl2-o2 hbr sio2 titane_nitride by these_morel to the group LTM_LETI_etching on 2006-05-10 08:13:25 as read along with 1 person Stanley_vrc
  • Patterning of W/WNx/poly-Si gate electrode using Cl2/O2 plasmas
    Microelectronic Engineering, Vol. 65, No. 3. (March 2003), pp. 285-292.
    by Hyoun-Woo Kim, Byong-Sun Jub, Chang-Jin Kangb, Joo-Tae Moon
    posted to cl2-o2 poly-si temperature tungsten-nitride by these_morel to the group LTM_LETI_etching on 2006-03-21 14:36:30 as read along with 2 people ashrafrkhan Stanley_vrc
  • Temperature Effect on Tungsten Etching Using a Cl2/O2 Helicon Discharge
    Journal of the Korean Physical Society, Vol. 43, No. 4. (October 2003), pp. 526-528.
    by Hyoun W Kim
    posted to cl2-o2 etching helicon-plasma temperature tungsten by these_morel to the group LTM_LETI_etching on 2006-03-21 12:00:53 as read along with 1 person Stanley_vrc
  • Mass spectrometry studies of resist trimming processes in HBr/O[sub 2] and Cl[sub 2]/O[sub 2] chemistries
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 23, No. 1. (2005), pp. 103-112.
    by E Pargon, O Joubert, T Chevolleau, G Cunge, Songlin Xu, Thorsten Lill
    posted to cl2-o2 hbr-o2 icp mass-spectrometry resist-trimming by these_morel to the group LTM_LETI_etching on 2006-03-21 11:34:47 as read
  • Molybdenum gate technology for ultrathin-body MOSFETs and FinFETs
    Electron Devices, IEEE Transactions on, Vol. 51, No. 12. (2004), pp. 1989-1996.
    by Daewon Ha, H Takeuchi, Yang-Kyu Choi, Tsu-Jae King
    posted to cl2-o2 etching molybdenum tcp_9400 by these_morel to the group LTM_LETI_etching on 2006-03-17 15:12:21 as read
  • Etching of ruthenium coatings in O[sub 2]- and Cl[sub 2]-containing plasmas
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 24, No. 1. (2006), pp. 1-8.
    by CC Hsu, JW Coburn, DB Graves
    posted to cl2-o2 plasma ruthenium by these_morel to the group LTM_LETI_etching on 2006-02-28 15:18:11 as **
  • Control of etching-product-dependent shape and selectivity in gate polysilicon reactive ion etching
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 16, No. 3. (1998), pp. 1038-1042.
    by Masaaki Sato, Yoshinobu Arita
    posted to cl2-o2 etching notching plasma poly-si rie selectivity sio2 by these_morel to the group LTM_LETI_etching on 2006-02-28 15:04:44 as read
  • Radio frequency plasma etching of Si/SiO[sub 2] by Cl[sub 2]/O[sub 2] : Improvements resulting from the time modulation of the processing gases
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 8, No. 6. (1990), pp. 1185-1191.
    by SC Mcnevin
    posted to cl2-o2 etching gate plasma poly-si sio2 by these_morel to the group LTM_LETI_etching on 2006-02-28 14:54:37 as read
  • Characterization of resist-trimming processes by quasi in situ x-ray photoelectron spectroscopy
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 22, No. 4. (2004), pp. 1869-1879.
    by E Pargon, O Joubert, Songlin Xu, Thorsten Lill
    posted to cl2-o2 hbr-o2 resist-trimming by these_morel to the group LTM_LETI_etching on 2006-02-17 15:14:13 as read
  • Investigation of etching properties of HfO based high-K dielectrics using inductively coupled plasma
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, No. 4. (2004), pp. 1552-1558.
    by Jinghao Chen, Won J Yoo, Zerlinda YL Tan, Yingqian Wang, Daniel SH Chan
    posted to cl2-o2 hbr-o2 hfalo hfo2 hfon hfsio high-k by these_morel to the group LTM_LETI_etching on 2006-02-17 15:12:43 as read
  • Chemistry of titanium dry etching in fluorinated and chlorinated gases
    pure and applied chemistry, Vol. 64, No. 5. (1992), pp. 703-707.
    by Francesco Fracassi, Riccardo D'agostino
    posted to cf4-o2 cl2-o2 titanium by these_morel to the group LTM_LETI_etching on 2006-02-17 14:06:01 as read
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